Integrated Circuits Design Quiz

What does MOSFET stand for?

• Microchip Operation System Framework Energy Transfer

• Multiple Output System Field Enhancement Technology

• Metal Oxide Semiconductor Field Effect Transistor

• Memory Overload System Function Execution Task

In which year did metal gates reemerge in MOSFET technology?

• 2015

• 2007

• 1995

• 1970

What is the purpose of photolithography in IC fabrication?

• To etch patterns on the wafer using UV light

• To deposit gate oxide on silicon wafers

• To create metal gates for transistors

• To carve pictures in stone using light

What is the function of a photomask in photolithography?

• To expose the photoresist to UV light

• To block the UV light where patterns are not needed

• To create a thick region of oxide

• To dissolve the soluble photoresist

What is the purpose of well and substrate taps in IC fabrication?

• To create a low resistance ohmic contact

• To grow SiO2 on top of Si wafer

• To form the gate oxide layer

• To deposit aluminum over the wafer

What is the material commonly used for metallization in IC fabrication?

• Gold (Au)

• Copper (Cu)

• Aluminum (Al)

• Silver (Ag)

What is the purpose of field oxide in IC fabrication?

• To provide isolation and prevent parasitic MOS channels

• To form the gate of the transistor

• To grow SiO2 on top of Si wafer

• To create a low resistance ohmic contact

What is the primary function of the n-well in CMOS technology?

• To tie the substrate to GND

• To fabricate NMOS transistors

• To create a low resistance ohmic contact

• To form the body of PMOS transistors

What is the purpose of ion implantation in IC fabrication?

• To grow SiO2 on top of Si wafer

• To deposit gate oxide on silicon wafers

• To etch patterns on the wafer using UV light

• To blast wafer with beam of ions for controlled doping

What is the significance of polysilicon in IC fabrication?

• To tie the substrate to GND

• To grow SiO2 on top of Si wafer

• To form the gate of the transistor

• To provide isolation and prevent parasitic MOS channels