Photolithography Process Quiz

What type of light is commonly used in photolithography?

• Infrared

• Visible

• Ultraviolet

• X-ray

What happens to positive photoresist when exposed to light?

• It becomes insoluble.

• It becomes soluble.

• It becomes opaque.

• It polymerizes.

What is the main purpose of a photomask in photolithography?

• To filter the light

• To transfer a pattern onto the photoresist

• To protect the substrate from contamination

• To focus the light

In photolithography, what is the term for the limit of the smallest feature size that can be reliably printed?

• Depth of focus

• Resolution

• Contrast

• Exposure

Which of the following is NOT a step in the photolithography process?

• Etching

• Prebake

• Deposition

• Development

Negative photoresist, when exposed to light, undergoes which of the following processes?

• Solubilization

• Decolorization

• Cross-linking

• Melting

What role does the developer solution play in the photolithography process?

• Hardens the photoresist

• Exposes the photoresist to light

• Removes either the exposed or unexposed areas of the photoresist

• Acts as a solvent for the etching process

Which principle of physics is crucial in understanding the limitations of photolithography resolution?

• Gravity

• Thermodynamics

• Diffraction

• Electrostatics

During the photolithography process, what is the purpose of the post-exposure bake?

• To clean the substrate

• To enhance the photochemical reactions in the photoresist

• To remove any remaining developer

• To prepare the substrate for etching

What is the primary function of the photoresist in photolithography?

• To act as an etchant

• To protect certain areas of the substrate during etching

• To generate light for exposure

• To clean the substrate