03.nanofabrication techniques

1. What is the primary goal of nanofabrication?

• A. Miniaturization
• B. Amplification
• C. Macro-scale assembly
• D. Chemical synthesis

2. Which technique uses a focused ion beam (FIB)?

• A. Photolithography
• B. Atomic layer deposition
• C. Electron beam lithography
• D. Ion beam milling

3. Which of the following is a top-down approach?

• A. Molecular beam epitaxy
• B. Self-assembly
• C. Dip-pen lithography
• D. Electron beam lithography

4. What is the purpose of a photomask in lithography?

• A. To transfer the pattern
• B. To clean the substrate
• C. To deposit a thin film
• D. To align the layers

5. Which technique is commonly used for nanoimprint lithography?

• A. Scanning probe lithography
• B. Nanoimprint lithography
• C. Molecular beam epitaxy
• D. Dip-pen lithography

6. What is the primary advantage of self-assembly techniques?

• A. High resolution
• B. Large-area patterning
• C. Versatility
• D. Precise control

7. Which technique is based on the selective removal of material?

• A. Atomic layer deposition
• B. Etching
• C. Chemical vapor deposition
• D. Molecular beam epitaxy

8. What does CVD stand for in the context of nanofabrication?

• A. Chemical vapor deposition
• B. Controlled vacuum drying
• C. Covalent bond dissociation
• D. Carbon vacancy detection

9. What is the primary advantage of electron beam lithography?

• A. High resolution
• B. Rapid fabrication
• C. Large-area patterning
• D. Low-cost equipment

10. Which technique is commonly used for growing thin films with atomic precision?

• A. Atomic layer deposition
• B. Scanning probe lithography
• C. Nanoimprint lithography
• D. Ion beam milling