ECE411_IonImp

Inside the ion implanter, what determines the implanted species?

• The ion source

• The mass filer

• The electrostatic accelerator

• The electrostatic deflector

At the same energy, which ions go deeper?

• Boron

• Phosphorous

• Arsenic

• Antimony

The advantages of ion implantation include:

• Ion implantation is cheap.

• Ion implantation has low lateral scattering.

• Ion implantation is quick.

• Ion implantation is maskable by many materials.

Channeling can be avoided by:

• Tilting and twisting the wafer.

• Implanting through oxide.

• Increasing the energy.

• Increasing the temperature.

Annealing is

• Diffusion at constant surface concentration.

• Diffusion at constant energy.

• Diffusion at constant dose.

• Diffusion for a short period.